Low-pressure plasma system V55-G

Standard system for cleaning, activation, etching or coating

The unit is integrated in a 19“ rack, which is equipped with rollers and height-adjustable feet.

The system can be used for the surface treatment methods cleaning, activation, etching and coating.

Type of system 19" cabinet
Dimensions of the chamber (W x D x H) 400 x 460 x 340 mm
Microwave power 100 – 1,200 W
Gas inlets with mass flow control 2
Power supply 230 / 400 V, 50 / 60 Hz
Power input (without pump) 2.2 kVA
Dimensions of the system (W x D x H) 670 x 900 x 1,850 mm
Options:  
Additional gas inlets 2
Additional excitation frequencies
(40 kHz, 13.56 MHz)
Soft start / slow vent
Lateral microwave coupling
Rotary table
Rotary drum
Pullout door
Automatic door opening

System features

  • USB port
  • Ethernet interface
  • Remote maintenance (VPN)
  • Microwave source (2.45 GHz)
  • Swing door