Low-pressure plasma system V55-G

Standard system for cleaning, activation, etching or coating

The unit is integrated in a 19“ rack, which is equipped with rollers and height-adjustable feet.

The system can be used for the surface treatment methods cleaning, activation, etching and coating.

Type of system	19" cabinet
Dimensions of the chamber (W x D x H)	400 x 460 x 340 mm
Microwave power	100 – 1,200 W
Gas inlets with mass flow control	2
Power supply	230 / 400 V, 50 / 60 Hz
Power input (without pump)	2.2 kVA
Dimensions of the system (W x D x H)	670 x 900 x 1,850 mm
Options:
Additional gas inlets	2
Additional excitation frequencies (40 kHz, 13.56 MHz)	√
Soft start / slow vent	√
Lateral microwave coupling	–
Rotary table	√
Rotary drum	√
Pullout door	√
Automatic door opening	√

System features

• USB port
• Ethernet interface
• Remote maintenance (VPN)
• Microwave source (2.45 GHz)
• Swing door