Low-pressure plasma system V55-G
Standard system for cleaning, activation, etching or coating
The unit is integrated in a 19“ rack, which is equipped with rollers and height-adjustable feet.The system can be used for the surface treatment methods cleaning, activation, etching and coating.

Type of system | 19" cabinet |
Dimensions of the chamber (W x D x H) | 400 x 460 x 340 mm |
Microwave power | 100 – 1,200 W |
Gas inlets with mass flow control | 2 |
Power supply | 230 / 400 V, 50 / 60 Hz |
Power input (without pump) | 2.2 kVA |
Dimensions of the system (W x D x H) | 670 x 900 x 1,850 mm |
Options: | |
Additional gas inlets | 2 |
Additional excitation frequencies (40 kHz, 13.56 MHz) |
√ |
Soft start / slow vent | √ |
Lateral microwave coupling | – |
Rotary table | √ |
Rotary drum | √ |
Pullout door | √ |
Automatic door opening | √ |
System features
- USB port
- Ethernet interface
- Remote maintenance (VPN)
- Microwave source (2.45 GHz)
- Swing door